A novel non-chemically amplified resist based on polystyrene-iodonium derivatives for electron beam lithography
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DOI: 10.1088/1361-6528/ad3c4c
Abstract: To break the resolution limitation of traditional resists, more work is needed on non-chemically amplified resists (non-CARs). Non-CARs based on iodonium salt modified polystyrene (PS-I) were prepared with controllable molecular weight and structure. The properties… read more here.
Keywords: resist; chemically amplified; beam lithography; non chemically ... See more keywords