Phase-field simulations of electromigration-induced defects in interconnects with non-columnar grain microstructure
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DOI: 10.1063/1.5145104
Abstract: In this work, we utilize a phase-field model to investigate electromigration-mediated defects in non-columnar polycrystalline interconnects. We find that the misalignment of the grain boundary with respect to an externally applied electric field governs the… read more here.
Keywords: non columnar; induced defects; phase field; electromigration induced ... See more keywords