Maskless lithography based on oblique scanning of point array with digital distortion correction
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DOI: 10.1016/j.optlaseng.2020.106313
Abstract: Abstract The oblique scanning of a rectangular array of ultraviolet (UV) spots provides a feasible means of realizing maskless lithography with well-controlled UV exposure. In such a method, the UV light is modulated by a… read more here.
Keywords: array; distortion; maskless lithography; oblique scanning ... See more keywords