Sign Up to like & get
recommendations!
0
Published in 2021 at "Optics and Lasers in Engineering"
DOI: 10.1016/j.optlaseng.2020.106313
Abstract: Abstract The oblique scanning of a rectangular array of ultraviolet (UV) spots provides a feasible means of realizing maskless lithography with well-controlled UV exposure. In such a method, the UV light is modulated by a…
read more here.
Keywords:
array;
distortion;
maskless lithography;
oblique scanning ... See more keywords