Proximity Effect in Gate Fabrication Using Photolithography Technique
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DOI: 10.15598/aeee.v15i2.2024
Abstract: In the paper the technological factors influencing test structure gate length were described. The influence of test structure gate placement (Schottky metallization between ohmic contacts, on mesa and on GaN surface) was analyzed and discussed.… read more here.
Keywords: gate fabrication; gate; effect gate; test ... See more keywords