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Published in 2018 at "IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems"
DOI: 10.1109/tcad.2017.2750068
Abstract: In this paper, we propose a novel methodology for machine learning-based hotspot detection that uses lithography information to build support vector machine (SVM) during its learning process. Unlike previous studies that use only geometric information…
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Keywords:
machine;
opc mask;
hotspot detection;
machine learning ... See more keywords