Fully controllable silicon nanowire fabricated using optical lithography and orientation dependent oxidation
Sign Up to like & getrecommendations! Published in 2020 at "Applied Surface Science"
DOI: 10.1016/j.apsusc.2020.146516
Abstract: Abstract Silicon nanowires (SiNWs) exhibit unique electrical, thermal, and optical properties compared to bulk silicon which make them suitable for various device applications. To realize nanowires in real applications, large-scale and low-cost fabrication method is… read more here.
Keywords: lithography orientation; using optical; optical lithography; orientation dependent ... See more keywords
Development of micro-ring resonator-based optical bandpass filter using SU-8 polymer and optical lithography
Sign Up to like & getrecommendations! Published in 2018 at "Optical Materials"
DOI: 10.1016/j.optmat.2018.01.024
Abstract: Abstract Laterally-coupled SU-8 ridge waveguide-based micro-ring resonator was designed, fabricated and characterized for optical filtering applications. Fabrication was done by optical lithography using a patterned chrome mask of SU-8 ridge waveguide and micro-ring resonator structures,… read more here.
Keywords: micro ring; ring resonator; optical lithography;
Direct Optical Lithography Enabled Multispectral Colloidal Quantum-Dot Imagers from Ultraviolet to Short-Wave Infrared
Sign Up to like & getrecommendations! Published in 2022 at "ACS Nano"
DOI: 10.1021/acsnano.2c07586
Abstract: Complementary metal oxide semiconductor (CMOS) silicon sensors play a central role in optoelectronics with widespread applications from small cell phone cameras to large-format imagers for remote sensing. Despite numerous advantages, their sensing ranges are limited… read more here.
Keywords: colloidal quantum; optical lithography; short wave; direct optical ... See more keywords
Boron and high-k dielectrics: Possible fourth etch stop colors for multipattern optical lithography processing
Sign Up to like & getrecommendations! Published in 2017 at "Journal of Vacuum Science and Technology"
DOI: 10.1116/1.4974920
Abstract: In a companion article, the etch characteristics of materials within the Si-C-O-N-H system were surveyed using two common fluorinated plasma etches used to etch SiO2 interlayer dielectrics and SiN:H etch stop layers (CHF3 and CF4/O2,… read more here.
Keywords: high dielectrics; etch stop; optical lithography; etch ... See more keywords
Nanopatterning of monolayer graphene by quantum optical lithography.
Sign Up to like & getrecommendations! Published in 2021 at "Applied optics"
DOI: 10.1364/ao.419831
Abstract: Quantum optical lithography, a diffraction-unlimited method, was applied to pattern monolayer graphene at 10 nm resolution. In our tests with chemical vapor deposition monolayer graphene samples, we have succeeded in producing flat surfaces of a… read more here.
Keywords: monolayer graphene; quantum optical; optical lithography; monolayer ... See more keywords
Information theoretical aspects in coherent optical lithography systems
Sign Up to like & getrecommendations! Published in 2017 at "Optics Express"
DOI: 10.1364/oe.25.029043
Abstract: Optical lithography is extensively used in micro and nano scale semiconductor fabrication. However, the information transmission mechanism in lithography systems is not yet completely understood. This paper studies and analyzes the lithography imaging process from… read more here.
Keywords: lithography systems; information; optical lithography; information theoretical ... See more keywords
Model-driven convolution neural network for inverse lithography.
Sign Up to like & getrecommendations! Published in 2018 at "Optics express"
DOI: 10.1364/oe.26.032565
Abstract: Optical lithography is a fundamental process to fabricate integrated circuits, which are the basic fabric of the information age. Due to image distortions inherent in optical lithography, inverse lithography techniques (ILT) are extensively used by… read more here.
Keywords: inverse lithography; network; optical lithography; model ... See more keywords
The Inverse Optimization of an Optical Lithographic Source with a Hybrid Genetic Algorithm
Sign Up to like & getrecommendations! Published in 2023 at "Applied Sciences"
DOI: 10.3390/app13095708
Abstract: As an effective resolution enhancement technology, source optimization (SO) is considered key for significantly improving the image quality of optical lithography at advanced nodes. To solve the problem of unsatisfactory SO performance, it is necessary… read more here.
Keywords: genetic algorithm; optical lithography; source; hybrid genetic ... See more keywords
Useful way to compensate for intrinsic birefringence caused by calcium fluoride in optical lithography systems
Sign Up to like & getrecommendations! Published in 2018 at "Chinese Optics Letters"
DOI: 10.3788/col201816.032201
Abstract: Calcium fluoride is widely used in optical lithography lenses and causes retardation that cannot be ignored. However, few studies have been conducted to compensate for the retardation caused by calcium fluoride in optical lithography systems.… read more here.
Keywords: calcium fluoride; optical lithography; calcium; caused calcium ... See more keywords