Low-rank manifold optimization for overlay variations in lithography process
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DOI: 10.1016/j.jprocont.2017.11.006
Abstract: Abstract Overlay variations occur frequently in lithography process, which should be controlled within the tolerance to guarantee the better pattern resolutions. The operational optimization of overlay aims to predict the unknown overlay variations and compensate… read more here.
Keywords: optimization overlay; overlay variations; optimization; low rank ... See more keywords