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Published in 2024 at "ACS applied materials & interfaces"
DOI: 10.1021/acsami.4c06009
Abstract: Extreme-ultraviolet (EUV) photolithography, which enables the high-throughput production of well-defined patterns with critical dimensions on the scale of several nanometers, is essential for the fabrication of a highly integrated semiconductor. The full exploitation of EUV…
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Keywords:
photolithography;
organooxotin clusters;
ordered organooxotin;
extreme ultraviolet ... See more keywords