Local monitoring of atomic steps on GaAs(001) surface under oxidation, wet removal of oxides and thermal smoothing
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DOI: 10.1016/j.apsusc.2017.02.062
Abstract: Abstract The GaAs(001) step-terraced surface relief is studied under oxidation, wet oxide removal and thermal smoothing by ex situ atomic force microscopy with local monitoring of specific atomic steps using lithographic marks for surface area… read more here.
Keywords: thermal smoothing; atomic steps; surface; oxidation wet ... See more keywords
Oxidation and wet etching behavior of sputtered Mo-Ti-Al films
Sign Up to like & getrecommendations! Published in 2018 at "Journal of Vacuum Science and Technology"
DOI: 10.1116/1.5009289
Abstract: Exposure of Mo thin films above 300 °C in ambient atmosphere results in surface oxidation, leading to the formation of colored oxide films deteriorating their performance in thin film transistor liquid crystal displays. In this study,… read more here.
Keywords: wet etching; behavior sputtered; oxidation wet; etching behavior ... See more keywords