Very large remanent polarization in ferroelectric Hf1-xZrxO2 grown on Ge substrates by plasma assisted atomic oxygen deposition
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DOI: 10.1063/1.5090036
Abstract: Plasma assisted atomic oxygen deposition was used to grow polycrystalline ferroelectric Hf1-xZrxO2 (x = 0.5–0.7) on technologically important (100) Germanium substrates showing sharp crystalline interfaces free of interfacial amorphous layers and strong evidence for the presence of… read more here.
Keywords: oxygen deposition; ferroelectric hf1; assisted atomic; plasma assisted ... See more keywords