Numerical investigation of vacuum ultra-violet emission in Ar/O2 inductively coupled plasmas
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DOI: 10.1088/1361-6595/ad7059
Abstract: Controlling fluxes of vacuum ultraviolet (VUV) radiation is important in a number of industrial and biomedical applications of low pressure plasma sources because, depending on the process, VUV radiation may be desired, required to a… read more here.
Keywords: pressure; oxygen vuv; vuv; emission ... See more keywords