Optical, structural, and mechanical properties of silicon oxynitride films prepared by pulsed magnetron sputtering.
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DOI: 10.1364/ao.56.00c168
Abstract: Silicon oxynitride films were deposited by reactive pulsed magnetron sputtering. The optical, structural, and mechanical properties of silicon oxynitride films with different nitrogen proportions were analyzed via spectroscopy, atomic force microscopy, Twyman-Green interferometer, and nanoindentation.… read more here.
Keywords: magnetron sputtering; silicon oxynitride; oxynitride films; pulsed magnetron ... See more keywords