Investigation of the RF Sputtering Process and the Properties of Deposited Silicon Oxynitride Layers under Varying Reactive Gas Conditions
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DOI: 10.3390/ma15186313
Abstract: In a single process run, an amorphous silicon oxynitride layer was grown, which includes the entire transition from oxide to nitride. The variation of the optical properties and the thickness of the layer was characterized… read more here.
Keywords: gas; silicon oxynitride; oxynitride layers; layer ... See more keywords