Inertial focusing in a parallelogram profiled microchannel over a range of aspect ratios
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DOI: 10.1186/s40486-019-0102-9
Abstract: In this study, particle focusing phenomena are studied in parallelogram and rectangular cross-sectioned microchannels of varying aspect ratio. In contrast to prior work the microchannels were fabricated using anisotropic wet etching of a Si wafer,… read more here.
Keywords: aspect ratio; microchannel range; focusing parallelogram; profiled microchannel ... See more keywords