The Influence of Microstructure on Nanomechanical and Diffusion Barrier Properties of Thin PECVD SiOx Films Deposited on Parylene C Substrates
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DOI: 10.3389/fmats.2019.00319
Abstract: Plasma-enhanced chemical vapor deposition (PECVD) was used to deposit SiOx thin films of varying thicknesses on parylene C substrates, using hexamethyldisiloxane (HMDSO) as a precursor. The microstructure of SiOx coatings was analyzed using X-ray photoemission… read more here.
Keywords: influence microstructure; siox; parylene substrates; barrier properties ... See more keywords