Comparison of passivation properties of plasma-assisted ALD and APCVD deposited Al2O3 with SiNx capping
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DOI: 10.1016/j.solmat.2020.110718
Abstract: Abstract In this paper, we report on the direct comparison of Al2O3 films deposited by plasma-assisted atomic layer deposition (ALD) and atmospheric pressure chemical vapor deposition (APCVD) techniques on the passivation properties of both bare… read more here.
Keywords: deposited al2o3; passivation; plasma assisted; ald apcvd ... See more keywords