Silicon Passivation by Ultrathin Hafnium Oxide Layer for Photoelectrochemical Applications
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DOI: 10.3389/fchem.2022.859023
Abstract: Hafnium oxide (HfO2) films on silicon have the potential for application in photovoltaic devices. However, very little is known about the photoelectrochemical and protective properties of HfO2 films on Si. In this study, ultrathin films… read more here.
Keywords: hfo2 films; hafnium oxide; silicon passivation; film ... See more keywords