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Published in 2022 at "Optics express"
DOI: 10.1364/oe.460780
Abstract: Maskless lithography based on a digital micromirror device (DMD) has the advantages of high process flexibility and a low production cost. However, due to the trade-off relationship between the pixel size and exposure area, it…
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Keywords:
pattern quality;
dmd;
pulse exposure;
method ... See more keywords
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Published in 2021 at "Optics letters"
DOI: 10.1364/ol.415788
Abstract: In this paper, we propose spatiotemporal modulation projection lithography (STPL) technology, which is a spatiotemporal modulation technology applied to the conventional digital micromirror device (DMD) projection lithography system. Through coordinating the micro-movement of the piezoelectric…
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Keywords:
pattern quality;
lithography;
quality enhancement;
technology ... See more keywords
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Published in 2019 at "Nanophotonics"
DOI: 10.1515/nanoph-2019-0031
Abstract: Abstract Quantitative analysis of line edge roughness (LER) is very important for understanding the root causes of LER and thereby improving the pattern quality in near-field lithography (NFL), because LER has become the main limiter…
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Keywords:
quality;
quantitative analysis;
near field;
edge roughness ... See more keywords
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1
Published in 2019 at "Micromachines"
DOI: 10.3390/mi10100706
Abstract: Imprinting pressure is the significant factor for composite mould durability and pattern quality during UV nanoimprinting on complex surfaces. To solve these problems, the effects of imprinting pressure on the damage of flexible composite mould…
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Keywords:
pattern quality;
composite mould;
pressure;
imprinting pressure ... See more keywords