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Published in 2017 at "IEEE Transactions on Electron Devices"
DOI: 10.1109/ted.2017.2724921
Abstract: High-voltage lateral double-diffused MOSFETs with partial buried P/N-type silicon layers (PBPL/PBNL) in silicon-on-insulator (SOI) technology are investigated numerically. In the lateral direction, the partial buried silicon layer (PBL) can introduce an additional electric field peak,…
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Keywords:
high voltage;
partial buried;
layer;
pbpl pbnl ... See more keywords