Study of indium catalyst thickness effect on PECVD-grown silicon nanowires properties
Sign Up to like & getrecommendations! Published in 2017 at "Journal of Materials Science: Materials in Electronics"
DOI: 10.1007/s10854-017-6722-z
Abstract: In this work, we focus on the elaboration at low temperature of metal-catalyzed silicon nanowires (SiNWs) obtained by vapor–liquid–solid (VLS) process. In particular, the effect of the metal thickness on SiNWs properties is reported. SiNWs… read more here.
Keywords: silicon nanowires; pecvd; indium catalyst; effect ... See more keywords
Mathematical Evaluation of a-Si:H Film Formation in rf-PECVD Systems
Sign Up to like & getrecommendations! Published in 2019 at "Silicon"
DOI: 10.1007/s12633-019-00167-9
Abstract: Radio frequency plasma enhanced chemical vapor deposition (rf-PECVD) is an efficient technique for preparing hydrogenated amorphous silicon (a-Si:H) layers used in thin film silicon solar cells. The most important parameters in a PECVD system are… read more here.
Keywords: pecvd; film formation; mathematical evaluation; deposition ... See more keywords
Optimization of N-doped TiO 2 multifunctional thin layers by low frequency PECVD process
Sign Up to like & getrecommendations! Published in 2017 at "Journal of The European Ceramic Society"
DOI: 10.1016/j.jeurceramsoc.2017.05.010
Abstract: Abstract A one-step low-frequency Plasma Enhanced Chemical Vapor Deposition (PECVD) process, operating at temperature as low as 350 °C, has been implemented to prepare single-oriented pure and N-doped anatase films. The layers have been synthesized using… read more here.
Keywords: thin layers; low frequency; pecvd process; pecvd ... See more keywords
Low residual stress in hydrogenated amorphous silicon-carbon films deposited by low-temperature PECVD
Sign Up to like & getrecommendations! Published in 2019 at "Journal of Materials Research and Technology"
DOI: 10.1016/j.jmrt.2019.09.026
Abstract: Abstract Low residual stress in hydrogenated amorphous silicon-carbon (a-SixC1-x:H) films prepared by plasma-enhanced chemical vapor deposition (PECVD) at temperature range of 100–200 °C was obtained. Profilometry, Fourier transform infrared (FTIR) spectroscopy and atomic force microscopy (AFM)… read more here.
Keywords: carbon; temperature; pecvd; residual stress ... See more keywords
Functionalization of MCM-41 with titanium oxynitride deposited via PECVD for enhanced removal of methylene blue
Sign Up to like & getrecommendations! Published in 2019 at "Journal of Molecular Liquids"
DOI: 10.1016/j.molliq.2018.10.154
Abstract: Abstract TiON and TiO2 were grafted onto the surfaces of mesoporous silica MCM-41 by plasma enhanced chemical vapour deposition (PECVD). The results of small-angle X-ray diffraction (SAXRD), X-ray diffraction, X-ray photoelectron spectroscopy, transmission electron microscopy,… read more here.
Keywords: pecvd; functionalization mcm; methylene blue; adsorption ... See more keywords
Improved photoelectric properties of p-µc-Si:H/p-a-SiOx:H window layer deposited by RF-PECVD
Sign Up to like & getrecommendations! Published in 2017 at "Materials Science in Semiconductor Processing"
DOI: 10.1016/j.mssp.2017.07.006
Abstract: Abstract The p type microcrystalline silicon (p-µc-Si:H)/p type hydrogenated amorphous silicon oxide (p-a-SiO x :H) window layers were fabricated by (13.56 MHz) radio-frequency plasma enhanced chemical vapor deposition (RF-PECVD) with N 2 O as oxygen source… read more here.
Keywords: pecvd; window layer; layer; photoelectric properties ... See more keywords
Structural and optical properties of arsenic sulfide films synthesized by a novel PECVD-based approach
Sign Up to like & getrecommendations! Published in 2017 at "Superlattices and Microstructures"
DOI: 10.1016/j.spmi.2017.08.007
Abstract: Abstract A new plasma-enhanced chemical vapor deposition-based (PECVD) approach for synthesizing of As-S films, with As content in the range 60–40 at.%, is demonstrated. The process has been carried out in a low-temperature Ar-plasma, employing for… read more here.
Keywords: structural optical; plasma; pecvd; optical properties ... See more keywords
Effect of deposition pressures on uniformity, mechanical and tribological properties of thick DLC coatings inside of a long pipe prepared by PECVD method
Sign Up to like & getrecommendations! Published in 2019 at "Surface and Coatings Technology"
DOI: 10.1016/j.surfcoat.2019.07.030
Abstract: Abstract Diamond-like carbon (DLC) coatings, as an excellent wear-resistant and low friction material, have been successfully applied as the surface protection and lubrication of various components. Recently, its application in the pipe fittings has gradually… read more here.
Keywords: thick dlc; pecvd; deposition pressures; dlc coatings ... See more keywords
Influence of PECVD Deposition Power and Pressure on Phosphorus-Doped Polysilicon Passivating Contacts
Sign Up to like & getrecommendations! Published in 2020 at "IEEE Journal of Photovoltaics"
DOI: 10.1109/jphotov.2020.3001166
Abstract: Passivating contacts for silicon solar cells can be fabricated by depositing a layer of intrinsic amorphous silicon (a-Si) by the plasma-enhanced chemical vapor deposition (PECVD) onto an oxidized silicon wafer, followed by a thermal POCl3… read more here.
Keywords: pecvd; power; deposition power; passivating contacts ... See more keywords
Amorphous gallium oxide grown by low-temperature PECVD
Sign Up to like & getrecommendations! Published in 2018 at "Journal of Vacuum Science and Technology"
DOI: 10.1116/1.5018800
Abstract: Owing to the wide application of metal oxides in energy conversion devices, the fabrication of these oxides using conventional, damage-free, and upscalable techniques is of critical importance in the optoelectronics community. Here, the authors demonstrate… read more here.
Keywords: amorphous gallium; low temperature; gallium oxide; pecvd ... See more keywords
128-pixel arrays of 4H-SiC UV APD with dual-frequency PECVD SiNx passivation.
Sign Up to like & getrecommendations! Published in 2020 at "Optics express"
DOI: 10.1364/oe.402323
Abstract: In this paper, high-performance 1×128 linear arrays of 4H-SiC ultraviolet (UV) avalanche photodiode (APD) with dual-frequency plasma enhanced chemical vapor deposition (PECVD) passivation are demonstrated for the first time. The results show that SiNx dielectric… read more here.
Keywords: arrays sic; passivation; pecvd; frequency ... See more keywords