Plasma-induced damage and annealing repairing in ALD-Al2O3/PECVD-SiNx stacks
Sign Up to like & getrecommendations! Published in 2019 at "Materials Science in Semiconductor Processing"
DOI: 10.1016/j.mssp.2019.05.010
Abstract: Abstract We study the effect of plasma-enhanced chemical vapor deposition (PECVD) SiNx process to atomic layer deposited (ALD) Al2O3 films on crystalline silicon surface passivation. The plasma-induced damage on Al2O3 films is affected by the… read more here.
Keywords: plasma induced; pecvd sinx; ald al2o3; al2o3 films ... See more keywords
Performance of THz Components Based on Microstrip PECVD SiNx Technology
Sign Up to like & getrecommendations! Published in 2017 at "IEEE Transactions on Terahertz Science and Technology"
DOI: 10.1109/tthz.2017.2759507
Abstract: We present a performance analysis of passive THz components based on Microstrip transmission lines with a 2-μm-thin plasma-enhanced chemical vapor deposition grown silicon nitride (PECVD SiNx) dielectric layer. A set of thru-reflect-line calibration structures is… read more here.
Keywords: thz components; components based; technology; pecvd sinx ... See more keywords