Dip-In Photoresist for Photoinhibited Two-Photon Lithography to Realize High-Precision Direct Laser Writing on Wafer.
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DOI: 10.1021/acsami.2c08063
Abstract: For decades, photoinhibited two-photon lithography (PI-TPL) has been continually developed and applied into versatile nanofabrication. However, ultrahigh precision fabrication on wafer by PI-TPL remains challenging, due to the lack of a refractive index (n) matched… read more here.
Keywords: lithography; photoresist; photoinhibited two; tpl ... See more keywords