Photopolymerization of Thick Layers of Compositions for Mask-Based Stereolithographic Synthesis
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DOI: 10.1134/s0018143919050059
Abstract: The influence of the conditions of mask-based photopolymerization of thick layers of a composition (with thickness h from 0.5 to 4.0 mm) based on dimethacrylate OCM-2 and o-quinone photoinitiator on the geometry of the resulting… read more here.
Keywords: photopolymerization thick; mask based; photopolymerization; thick layers ... See more keywords