Ethyl Cellulose-based Thermoreversible Organogel Photoresist for Sedimentation-free Volumetric Additive Manufacturing.
Sign Up to like & getrecommendations! Published in 2022 at "Macromolecular rapid communications"
DOI: 10.1002/marc.202200872
Abstract: Liquid photoresists are abundant in the field of light-based additive manufacturing (AM). However, printing unsupported directly into a vat of material in emerging volumetric AM technologies-typically a benefit due to fewer geometric constraints and less… read more here.
Keywords: photoresist; ethyl cellulose; sedimentation; additive manufacturing ... See more keywords
Synthesis of novel copolymer based on precipitation polymerization and its application in positive-tone photoresist
Sign Up to like & getrecommendations! Published in 2017 at "Journal of Polymer Research"
DOI: 10.1007/s10965-017-1370-9
Abstract: A series of copolymers Poly (TBA-CA-St-ASM)(PTCSA) were synthesized via precipitation polymerization by using tert-Butyl acrylate (TBA), Styrene (St), p-acetoxy styrene (ASM), and cedryl methacrylate (CA) as co-monomer. Then, Poly (TBA-CA-St-HS)(PTCSH) was prepared in the presence… read more here.
Keywords: precipitation polymerization; photoresist; synthesis; positive tone ... See more keywords
I-line photoresist composed of multifunctional acrylate, photo initiator, and photo acid generator, which can be patterned after g-line photo-crosslinking
Sign Up to like & getrecommendations! Published in 2018 at "Microelectronic Engineering"
DOI: 10.1016/j.mee.2018.04.004
Abstract: Abstract A positive-tone photoresist which can be patterned after photo-crosslinking was prepared. The photoresist is mainly composed of a multifunctional acrylate having a tertiary ester structure, a photo radical initiator, and a photo-acid generator (PAG).… read more here.
Keywords: acrylate; initiator; line; photo ... See more keywords
Dip-In Photoresist for Photoinhibited Two-Photon Lithography to Realize High-Precision Direct Laser Writing on Wafer.
Sign Up to like & getrecommendations! Published in 2022 at "ACS applied materials & interfaces"
DOI: 10.1021/acsami.2c08063
Abstract: For decades, photoinhibited two-photon lithography (PI-TPL) has been continually developed and applied into versatile nanofabrication. However, ultrahigh precision fabrication on wafer by PI-TPL remains challenging, due to the lack of a refractive index (n) matched… read more here.
Keywords: lithography; photoresist; photoinhibited two; tpl ... See more keywords
Making thick photoresist SU-8 flat on small substrates
Sign Up to like & getrecommendations! Published in 2018 at "Journal of Micromechanics and Microengineering"
DOI: 10.1088/1361-6439/aaed1c
Abstract: This work suggests a simple method to flatten thick layers (similar to 50-200 mu m) of SU-8 photoresist on small substrates (similar to 1 cm). The method sidesteps the edge beads problem and enables photolithography… read more here.
Keywords: small substrates; photoresist flat; making thick; photoresist ... See more keywords
Negative-tone molecular glass photoresist for high-resolution electron beam lithography
Sign Up to like & getrecommendations! Published in 2021 at "Royal Society Open Science"
DOI: 10.1098/rsos.202132
Abstract: A low molecular weight organic compound containing bis-phenol A backbone (BPA-6OH) is reported as a negative-tone photoresist. This material has a high glass transition temperature and excellent thermal stability. A good contrast, well-resolved line pattern… read more here.
Keywords: tone molecular; tone; photoresist; molecular glass ... See more keywords
Exposure-dependent refractive index of Nanoscribe IP-Dip photoresist layers.
Sign Up to like & getrecommendations! Published in 2019 at "Optics letters"
DOI: 10.1364/ol.44.000029
Abstract: The refractive indices of photoresists used for direct laser writing (DLW) have been determined after exposure to ultraviolet (UV) light. However, it was anticipated that the refractive index will differ when applying a two-photon polymerization… read more here.
Keywords: dip; dependent refractive; exposure dependent; refractive index ... See more keywords
Using the Taguchi-Genetic Algorithm to Improve Lithographic Photoresist Operating Conditions of Touch Panels to Upgrade After-Develop Inspection
Sign Up to like & getrecommendations! Published in 2018 at "Applied Sciences"
DOI: 10.3390/app8122382
Abstract: In order to use touch control products more conveniently, a general objective is to develop lighter and smaller touch panels. A touch panel using the one glass solution (OGS) is an important development. The black… read more here.
Keywords: touch panels; genetic algorithm; process; photoresist ... See more keywords
Microfluidic Long-Term Gradient Generator with Axon Separation Prototyped by 185 nm Diffused Light Photolithography of SU-8 Photoresist
Sign Up to like & getrecommendations! Published in 2018 at "Micromachines"
DOI: 10.3390/mi10010009
Abstract: We have developed a cast microfluidic chip for concentration gradient generation that contains a thin (~5 µm2 cross-sectional area) microchannel. The diffusion of diffused 185 nm ultraviolet (UV) light from an inexpensive low-pressure mercury lamp… read more here.
Keywords: concentration gradient; microfluidic long; long term; photoresist ... See more keywords
Powder Process with Photoresist for Ceramic Electronic Components
Sign Up to like & getrecommendations! Published in 2018 at "Powder Technology"
DOI: 10.5772/intechopen.76881
Abstract: This chapter proposed a patterning process for ceramic electronic components. The proposed process uses a photoresist, and it is combined with the photolithography process and the printing process. By using both technologies, a high-aspect-ratio and… read more here.
Keywords: pattern; ceramic electronic; sheet; process ... See more keywords