Light-absorbent liquid immersion angled exposure for patterning 3D samples with vertical sidewalls
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DOI: 10.1088/1361-6439/aa5429
Abstract: To make photolithography patterns on 3D samples, the angled (inclined) exposure technique has been used so far. However, technological issues have emerged in making photolithography patterns on the surface of trench structures. The surface of… read more here.
Keywords: light absorbent; immersion; absorbent liquid; liquid immersion ... See more keywords