Efficient optical proximity correction based on virtual edge and mask pixelation with two-phase sampling.
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DOI: 10.1364/oe.415913
Abstract: Optical proximity correction (OPC) is a widely used resolution enhancement technique (RET) in optical lithography to improve the image fidelity and process robustness. The efficiency of OPC is very important, especially for full-chip modification with… read more here.
Keywords: mask; phase sampling; pixelation two; two phase ... See more keywords