Precursors for Atmospheric Plasma‐Enhanced Sintering: Low‐Temperature Inkjet Printing of Conductive Copper
Sign Up to like & getrecommendations! Published in 2018 at "ChemistryOpen"
DOI: 10.1002/open.201800131
Abstract: Abstract Bidentate diamine and amino‐alcohol ligands have been used to form solid, water‐soluble, and air‐stable monomeric copper complexes of the type [Cu(NH2CH2CH(R)Y)2(NO3)2] (1, R=H, Y=NH2; 2, R=H, Y=OH; 3, R=Me, Y=OH). The complexes were characterized… read more here.
Keywords: enhanced sintering; temperature; copper; conductive copper ... See more keywords
Plasma enhanced synthesis of N doped vertically aligned carbon nanofibers on 3D graphene
Sign Up to like & getrecommendations! Published in 2018 at "Surface and Interface Analysis"
DOI: 10.1002/sia.6604
Abstract: 290 © 2018 John Wiley & Sons, Ltd. Graphene and carbon nanotubes/fibers (CNT/CNF) hybrid structures are emerging as frontier materials for high‐efficiency electronics, energy storage, thermoelectric, and sensing applications owing to the utilization of extraordinary… read more here.
Keywords: plasma; carbon; enhanced synthesis; vertically aligned ... See more keywords
Thermal annealing effects on the stress stability in silicon dioxide films grown by plasma-enhanced chemical vapor deposition
Sign Up to like & getrecommendations! Published in 2017 at "Microsystem Technologies"
DOI: 10.1007/s00542-016-3005-1
Abstract: The stress stability in plasma-enhanced chemical vapor deposition (PECVD) silicon dioxide (SiO2) films is a key factor of device performance. In this study, the PECVD SiO2 films are annealed at 400–1000 °C in a nitrogen (N2)… read more here.
Keywords: stress stability; chemical vapor; enhanced chemical; stability ... See more keywords
Plasma Enhanced Atomic Layer Deposited HfO2 Ferroelectric Films for Non-volatile Memory Applications
Sign Up to like & getrecommendations! Published in 2019 at "Journal of Electronic Materials"
DOI: 10.1007/s11664-019-07840-0
Abstract: For this proposed work, structural, electrical and ferroelectric properties of metal-insulator-silicon (MIS) and metal-insulator-metal (MIM) capacitors with different HfO2 (5 nm, 10 nm, 15 nm, 20 nm) thicknesses deposited on silicon and TiN/Silicon were investigated. The structural properties such… read more here.
Keywords: enhanced atomic; layer; atomic layer; layer deposited ... See more keywords
Atomic-scale characterization of plasma-induced damage in plasma-enhanced atomic layer deposition
Sign Up to like & getrecommendations! Published in 2017 at "Applied Surface Science"
DOI: 10.1016/j.apsusc.2017.06.241
Abstract: Abstract Plasma-enhanced atomic layer deposition (PE-ALD) has many advantages for the deposition of thin films. However, an appropriate control of the plasma frequency in the PE-ALD process is required to reduce the plasma-induced damage of… read more here.
Keywords: plasma induced; plasma; induced damage; deposition ... See more keywords
Comparative investigation of Si-C-N Films prepared by plasma enhanced chemical vapour deposition and magnetron sputtering
Sign Up to like & getrecommendations! Published in 2017 at "Applied Surface Science"
DOI: 10.1016/j.apsusc.2017.06.332
Abstract: Abstract This paper reports on the results of comparative investigations of Si-C-N films prepared by using both plasma enhanced chemical vapor deposition (PECVD) and DC magnetron sputtering (MS) at different nitrogen flow rates (F N2… read more here.
Keywords: magnetron sputtering; films prepared; spectroscopy; enhanced chemical ... See more keywords
Direct growth of single-layer terminated vertical graphene array on germanium by plasma enhanced chemical vapor deposition
Sign Up to like & getrecommendations! Published in 2019 at "Carbon"
DOI: 10.1016/j.carbon.2019.08.069
Abstract: Abstract Vertically aligned graphene nanosheet arrays (VAGNAs) exhibit large surface area, excellent electron transport properties, outstanding mechanical strength, high chemical stability, and enhanced electrochemical activity, which makes them highly promising for application in supercapacitors, batteries,… read more here.
Keywords: single layer; layer; graphene; enhanced chemical ... See more keywords
Plasma Enhanced Chemical Vapor Deposition synthesis of graphene-like structures from plasma state of CO2 gas
Sign Up to like & getrecommendations! Published in 2020 at "Carbon"
DOI: 10.1016/j.carbon.2020.05.057
Abstract: Abstract The Plasma Enhanced Chemical Vapor Deposition synthesis of graphene-like vertical structures from the plasma state of CO2 gas on various catalyst-free substrates is experimentally studied. A peculiarity of the synthesis conditions is the ability… read more here.
Keywords: deposition synthesis; chemical vapor; vapor deposition; enhanced chemical ... See more keywords
Ti–C bonds reinforced TiO2@C nanocomposite Na-ion battery electrodes by fluidized-bed plasma-enhanced chemical vapor deposition
Sign Up to like & getrecommendations! Published in 2021 at "Carbon"
DOI: 10.1016/j.carbon.2020.09.023
Abstract: Abstract Carbon coatings hold great promise for next-generation non-conductive energy storage nanomaterials. However, simplicity, stable, uniformity and high-performance remain unresolved issues. Here, unique synergy of the fluidized bed reactor with plasmas enables highly-effective, single-step fluidized-bed… read more here.
Keywords: enhanced chemical; plasma enhanced; bed plasma; fluidized bed ... See more keywords
Plasma-enhanced modification of polysaccharides for wastewater treatment: A review.
Sign Up to like & getrecommendations! Published in 2021 at "Carbohydrate polymers"
DOI: 10.1016/j.carbpol.2020.117195
Abstract: In this work, novel polysaccharide-based sorbents modified with plasma technologies are discussed. Plasma selectively modifies the surface properties by generating specific moieties, enhancing adsorption performance, and the physical-chemical properties of the material without modifying its… read more here.
Keywords: plasma; enhanced modification; plasma technologies; polysaccharide based ... See more keywords
Chemistry of SiNx thin film deposited by plasma-enhanced atomic layer deposition using di-isopropylaminosilane (DIPAS) and N2 plasma
Sign Up to like & getrecommendations! Published in 2018 at "Ceramics International"
DOI: 10.1016/j.ceramint.2018.08.095
Abstract: Abstract Silicon nitride (Si3N4) films have received great attention not only as dielectric materials for the gate dielectric of transistors and the insulator of capacitors, but also as a buffer layer and etch-stop layer for… read more here.
Keywords: plasma; layer; chemistry; deposition ... See more keywords