Improvement of coating adhesion on cemented carbide tools by plasma etching
Sign Up to like & getrecommendations! Published in 2017 at "Journal of the Brazilian Society of Mechanical Sciences and Engineering"
DOI: 10.1007/s40430-016-0545-3
Abstract: Surface treatments are one of the main factors to control adhesion between coating and substrate on a cutting tool. Poor coating adhesion on the substrate accelerates the wear progress and decreases tool lifetime due to… read more here.
Keywords: microscopy; coating adhesion; surface; adhesion ... See more keywords
Surface plasma-etching treatment of cobalt nanoparticles-embedded honeysuckle-like nitrogen-doped carbon nanotubes to produce high-performance catalysts for rechargeable zinc-air batteries
Sign Up to like & getrecommendations! Published in 2020 at "Journal of Power Sources"
DOI: 10.1016/j.jpowsour.2020.227858
Abstract: Abstract Developing high-performance and low-cost catalysts for oxygen reduction reaction (ORR) in metal-air batteries is challenging but necessary for their practical applications and commercialization. In this paper, a core-shell cobalt nanoparticles-embedded honeysuckle-like N-doped carbon nanotube… read more here.
Keywords: carbon; honeysuckle like; plasma etching; air ... See more keywords
Inductively coupled plasma nanoetching of atomic layer deposition alumina
Sign Up to like & getrecommendations! Published in 2018 at "Microelectronic Engineering"
DOI: 10.1016/j.mee.2018.02.023
Abstract: Abstract Al2O3 thin-film deposited by atomic layer deposition is an attractive plasma etch mask for Micro and Nano Electro-Mechanical Systems (MEMS and NEMS). 20-nm-thick Al2O3 mask enables through silicon wafer plasma etching. Al2O3 is also… read more here.
Keywords: plasma; atomic layer; al2o3; plasma etching ... See more keywords
Near-neutral-colored semitransparent perovskite films using a combination of colloidal self-assembly and plasma etching
Sign Up to like & getrecommendations! Published in 2017 at "Solar Energy Materials and Solar Cells"
DOI: 10.1016/j.solmat.2016.10.035
Abstract: Organo-lead-halide perovskite based solar cells have achieved remarkable advancements in power conversion efficiencies (PCEs) in recent years. Given their attractive properties, possible applications for perovskites are wide ranging and among others, particularly appealing for building… read more here.
Keywords: near neutral; assembly plasma; self assembly; plasma etching ... See more keywords
Armored Nanocones Engraved by Selective Laser Doping Enhanced Plasma Etching for Robust Supertransmissivity.
Sign Up to like & getrecommendations! Published in 2022 at "ACS applied materials & interfaces"
DOI: 10.1021/acsami.2c13033
Abstract: Optical antireflection surfaces equipped with subwavelength nanocone arrays are commonly used to reach broadband supertransmissivity but are limited by the lack of wear resistance. We design and manufacture a structured surface with robust antireflection structures… read more here.
Keywords: laser; plasma etching; supertransmissivity; nanocone arrays ... See more keywords
Revelation of the dislocations in the C-face of 4H-SiC substrates using a microwave plasma etching treatment
Sign Up to like & getrecommendations! Published in 2021 at "CrystEngComm"
DOI: 10.1039/d0ce01489c
Abstract: A novel microwave plasma etching technique was used to reveal various types of dislocation on the C-face of 4H-SiC. Etch pits formed on the C-face of 4H-SiC by H2–O2 plasma etching were observed using a… read more here.
Keywords: microwave plasma; plasma etching; face; face sic ... See more keywords
Molecular dynamic simulation study of plasma etching L10 FePt media in embedded mask patterning (EMP) process
Sign Up to like & getrecommendations! Published in 2017 at "AIP Advances"
DOI: 10.1063/1.4977223
Abstract: Plasma etching process of single-crystal L10-FePt media [H. Wang et al., Appl. Phys. Lett. 102(5) (2013)] is studied using molecular dynamic simulation. Embedded-Atom Method [M. S. Daw and M. I. Baskes, Phy. Rev. B 29,… read more here.
Keywords: dynamic simulation; l10 fept; plasma etching; process ... See more keywords
Electrical field-induced faceting of etched features using plasma etching of fused silica
Sign Up to like & getrecommendations! Published in 2017 at "Journal of Applied Physics"
DOI: 10.1063/1.4991706
Abstract: This paper reports a previously unreported anomaly that occurs when attempting to perform deep, highly anisotropic etches into fused silica using an Inductively-Coupled Plasma (ICP) etch process. Specifically, it was observed that the top portion… read more here.
Keywords: fused silica; highly anisotropic; using plasma; plasma etching ... See more keywords
The interplay between surface charging and microscale roughness during plasma etching of polymeric substrates
Sign Up to like & getrecommendations! Published in 2018 at "Journal of Applied Physics"
DOI: 10.1063/1.5018313
Abstract: The surface roughness developed during plasma etching of polymeric substrates is critical for a variety of applications related to the wetting behavior and the interaction of surfaces with cells. Toward the understanding and, ultimately, the… read more here.
Keywords: surface charging; surface; surface roughness; plasma etching ... See more keywords
Etching of iron and iron–chromium alloys using ICP-RIE chlorine plasma
Sign Up to like & getrecommendations! Published in 2021 at "Plasma Sources Science and Technology"
DOI: 10.1088/1361-6595/ac1714
Abstract: The dry etching process of Fe, Cr and Fe–Cr alloys under a chlorine-based plasma is studied. The objective is to create new surface functionalities. The approach combines an experimental study of an ICP (Inductively Coupled… read more here.
Keywords: plasma; iron chromium; plasma etching; iron ... See more keywords
Smooth plasma etching of GeSn nanowires for gate-all-around field effect transistors
Sign Up to like & getrecommendations! Published in 2021 at "Semiconductor Science and Technology"
DOI: 10.1088/1361-6641/abfbb5
Abstract: We report on the nanopatterning of horizontal and vertical germanium-tin (Ge1−x Sn x or GeSn) nanowires by inductively coupled plasma reactive ion etching for gate-all-around field effect transistors. First, a chlorine based chemistry has been… read more here.
Keywords: around field; gesn nanowires; plasma etching; gesn ... See more keywords