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Published in 2017 at "Fusion Engineering and Design"
DOI: 10.1016/j.fusengdes.2017.02.074
Abstract: Abstract In this paper, new results of plasma ι-profile and β control on TCV, using total plasma current Ip, and ECCD (Electron Cyclotron heating and Current Drive) heating source have been discussed. The control model…
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Keywords:
profile control;
control;
tcv;
plasma internal ... See more keywords