A multifunctional plasma and deposition sensor for the characterization of plasma sources for film deposition and etching
Sign Up to like & getrecommendations! Published in 2017 at "Journal of Applied Physics"
DOI: 10.1063/1.4995278
Abstract: Our recently reported multifunctional plasma and deposition sensor [Welzel et al., Appl. Phys. Lett. 102, 211605 (2013)] was used for the characterization of two different plasma sources: a magnetron sputtering deposition source and an ion… read more here.
Keywords: characterization; deposition etching; plasma; deposition ... See more keywords
External control of the synchronization dynamics of two inductively coupled glow discharge plasma sources
Sign Up to like & getrecommendations! Published in 2017 at "Physics of Plasmas"
DOI: 10.1063/1.5003175
Abstract: An experimental investigation of the influence of an external periodic forcing on the synchronization dynamics of two inductively coupled plasma sources is reported. The driven response of the coupled system is found to have a… read more here.
Keywords: dynamics two; two inductively; synchronization dynamics; plasma sources ... See more keywords
Dielectric barrier discharges: progress on plasma sources and on the understanding of regimes and single filaments
Sign Up to like & getrecommendations! Published in 2017 at "Plasma Sources Science and Technology"
DOI: 10.1088/1361-6595/aa6426
Abstract: Dielectric Barrier Discharges (DBDs) are plasmas generated in configurations with an insulating (dielectric) material between the electrodes which is responsible for a self-pulsing operation. DBDs are a typical example of nonthermal atmospheric or normal pressure… read more here.
Keywords: dielectric barrier; discharges progress; single filaments; plasma sources ... See more keywords
The Effect of Key Parameters on Power Absorption in Helicon Plasma Sources
Sign Up to like & getrecommendations! Published in 2020 at "IEEE Transactions on Plasma Science"
DOI: 10.1109/tps.2020.3003090
Abstract: In recent years, helicon plasma sources have attracted much attention from scientific centers and industry. In this regard, the power coupling is of particular importance for the production of dense plasma in these systems. Therefore,… read more here.
Keywords: plasma sources; power; key parameters; helicon plasma ... See more keywords
Insights to scaling remote plasma sources sustained in NF3 mixtures
Sign Up to like & getrecommendations! Published in 2017 at "Journal of Vacuum Science and Technology"
DOI: 10.1116/1.4978551
Abstract: Remote plasma sources (RPSs) are being developed for low damage materials processing during semiconductor fabrication. Plasmas sustained in NF3 are often used as a source of F atoms. NF3 containing gas mixtures such as NF3/O2… read more here.
Keywords: sustained nf3; remote plasma; insights scaling; scaling remote ... See more keywords
Scanning Deposition Method for Large-Area Diamond Film Synthesis Using Multiple Microwave Plasma Sources
Sign Up to like & getrecommendations! Published in 2022 at "Nanomaterials"
DOI: 10.3390/nano12121959
Abstract: The demand for synthetic diamonds and research on their use in next-generation semiconductor devices have recently increased. Microwave plasma chemical vapor deposition (MPCVD) is considered one of the most promising techniques for the mass production… read more here.
Keywords: synthesis; plasma; plasma sources; large area ... See more keywords