Near-infrared sensitivity improvement by plasmonic diffraction for a silicon image sensor with deep trench isolation filled with highly reflective metal.
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DOI: 10.1364/oe.428314
Abstract: We propose a plasmonic diffraction structure combined with deep trench isolation (DTI) filled with highly reflective metal to enhance the near-infrared (NIR) sensitivity of image sensors. The plasmonic diffraction structure has a silver grating on… read more here.
Keywords: deep trench; plasmonic diffraction; silicon; sensitivity ... See more keywords