Nanoscale 2.5-dimensional surface patterning with plasmonic lithography
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DOI: 10.1038/s41598-017-10047-0
Abstract: We report an extension of plasmonic lithography to nanoscale 2.5-dimensional (2.5D) surface patterning. To obtain the impulse response of a plasmonic lithography system, we described the field distribution of a point dipole source generated by… read more here.
Keywords: nanoscale dimensional; plasmonic lithography; surface patterning; dimensional surface ... See more keywords
Achieving high aspect ratio in plasmonic lithography for practical applications with sub-20 nm half pitch.
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DOI: 10.1364/oe.457995
Abstract: Plasmonic lithography, which exploits a bowtie nanoaperture (BNA) for the purpose of subwavelength near-field focusing, has the capability of high-resolution patterning. However, the ultra-small feature size is achieved at the price of sharply decay of… read more here.
Keywords: lithography; layer; plasmonic lithography; high aspect ... See more keywords
Study on forbidden pitch in plasmonic lithography: taking 365 nm wavelength thin silver film-based superlens imaging lithography as an example.
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DOI: 10.1364/oe.465650
Abstract: Plasmonic lithography can make the evanescent wave at the mask be resonantly amplified by exciting surface plasmon polariton (SPP) and participate in imaging, which can break through the diffraction limit in conventional lithography. It provides… read more here.
Keywords: lithography; pitch plasmonic; plasmonic lithography; forbidden pitch ... See more keywords