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Published in 2017 at "Superlattices and Microstructures"
DOI: 10.1016/j.spmi.2017.02.012
Abstract: Abstract A large amount of huge hexagonal hillocks were observed on the surface of N-polar GaN film grown on c-plane sapphire substrate by MOCVD. The distribution of residual stress and dislocation density in a typical…
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Keywords:
polar gan;
grown plane;
hillock;
residual stress ... See more keywords
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Published in 2017 at "ACS applied materials & interfaces"
DOI: 10.1021/acsami.7b01549
Abstract: Understanding the band bending at the interface of GaN/dielectric under different surface treatment conditions is critically important for device design, device performance, and device reliability. The effects of ultraviolet/ozone (UV/O3) treatment of the GaN surface…
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Keywords:
polar gan;
band bending;
treatment;
band ... See more keywords
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Published in 2020 at "RSC Advances"
DOI: 10.1039/d0ra07856e
Abstract: N-polar GaN films (C, D, E, F) grown with varied V/III ratio show improved crystallinity and reduced impurity concentrations.
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Keywords:
polar gan;
varied iii;
grown varied;
films grown ... See more keywords
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Published in 2021 at "Applied Physics Letters"
DOI: 10.1063/5.0058587
Abstract: The advantage of GaN is the capability of producing amplifiers with high output power and efficiency. At microwave frequencies, this performance has been achieved; however, when transitioning device design into mm-wave frequencies, the output power…
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Keywords:
linearity;
polar gan;
power;
output power ... See more keywords
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Published in 2019 at "Semiconductor Science and Technology"
DOI: 10.1088/1361-6641/ab08bf
Abstract: A two-step approach has been developed for the growth of semi-polar (11–22) GaN on patterned (113) silicon substrates, which effectively eliminates Ga melt-back etching at a high temperature, one of the most challenging issues. A…
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Keywords:
polar gan;
two step;
semi polar;
113 silicon ... See more keywords
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Published in 2019 at "Semiconductor Science and Technology"
DOI: 10.1088/1361-6641/ab4f16
Abstract: We report upon the microwave plasma chemical vapor deposition (MPCVD) growth of polycrystalline diamond on varying crystallographic orientations of GaN (Ga-polar and N-polar), as well as on Si3N4-coated N-polar GaN, as applied to top-side heat…
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Keywords:
si3n4 coated;
polar gan;
diamond films;
mpcvd growth ... See more keywords
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Published in 2018 at "Journal of Semiconductors"
DOI: 10.1088/1674-4926/39/7/074001
Abstract: An improved small-signal parameter extraction technique for short channel enhancement-mode N-polar GaN MOS-HEMT is proposed, which is a combination of a conventional analytical method and optimization techniques. The extrinsic parameters such as parasitic capacitance, inductance…
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Keywords:
polar gan;
parameter extraction;
mode polar;
small signal ... See more keywords
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2
Published in 2022 at "IEEE Access"
DOI: 10.1109/access.2022.3204668
Abstract: The low luminous efficiency of indium gallium nitride (InGaN) light-emitting diodes (LED) in the “green gap” range has been a long unsettled issue confounding the researchers. One of the main obstacles comes from the intrinsic…
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Keywords:
polar gan;
efficiency;
green gap;
gap range ... See more keywords
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1
Published in 2020 at "IEEE Electron Device Letters"
DOI: 10.1109/led.2020.3022401
Abstract: This work presents recent progress in the W-band (94 GHz) power performance of N-polar GaN deep recess HEMTs grown on sapphire substrates. While SiC has been the substrate of choice to achieve the highest level…
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Keywords:
polar gan;
recess hemts;
deep recess;
sapphire ... See more keywords
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Published in 2021 at "IEEE Microwave and Wireless Components Letters"
DOI: 10.1109/lmwc.2021.3067228
Abstract: This letter reports on the $W$ -band power performance of N-polar GaN deep recess MIS–high electron mobility transistors (HEMTs) using a new atomic layer deposition (ALD) ruthenium (Ru) gate metallization process. The deep recess structure…
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Keywords:
tex math;
polar gan;
deep recess;
inline formula ... See more keywords
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Published in 2022 at "Materials"
DOI: 10.3390/ma15093005
Abstract: High-temperature nitridation is commonly thought of as a necessary process to obtain N-polar GaN films on a sapphire substrate. In this work, high-quality N-polar GaN films were grown on a vicinal sapphire substrate with a…
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Keywords:
without intentional;
polar gan;
sapphire substrate;