Robust ferroelectric polarization retention in harsh environments through engineered domain wall pinning
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DOI: 10.1063/5.0029620
Abstract: Robust retention of ferroelectric polarization in harsh environments is a requirement for the application of ferroelectric materials in space, liquids, and various chemical conditions. Surface screening of the polarization can significantly alter domain states and… read more here.
Keywords: polarization; ferroelectric polarization; domain; polarization retention ... See more keywords
Ferroelectric polarization retention with scaling of Hf0.5Zr0.5O2 on silicon
Sign Up to like & getrecommendations! Published in 2021 at "Applied Physics Letters"
DOI: 10.1063/5.0035579
Abstract: In this paper, we investigate the polarization retention of Hf0.5Zr0.5O2 (HZO)-based metal–ferroelectric–insulator–Si (MFIS) capacitors with scaling of the ferroelectric (FE) layer thickness from 5 nm to 20 nm. The capacitors have a constant interface layer capacitance of… read more here.
Keywords: polarization; metal; hf0 5zr0; retention ... See more keywords