Diffuse X-ray scattering from polished silicon: application of the distorted wave Born approximation
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DOI: 10.1107/s1600577522000534
Abstract: Measurements of diffuse X-ray scattering from polished silicon were fit. The fits employed autocorrelation functions obtained from direct metrology of the surface roughness. read more here.
Keywords: polished silicon; silicon application; scattering polished; ray scattering ... See more keywords