Profile evolution during photochemical nano-polishing of a rough quartz surface under direct illumination.
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DOI: 10.1364/ao.460844
Abstract: A model for photochemical polishing of a rough quartz surface has been developed that uses the near field rising above a given surface under the action of electromagnetic radiation. The model allows solving the problem… read more here.
Keywords: profile evolution; quartz surface; surface; polishing rough ... See more keywords