Freestanding patterned polycrystalline GaN substrate by a straightforward and affordable technique
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DOI: 10.1016/j.mssp.2018.07.029
Abstract: Abstract A new process for producing a freestanding patterned polycrystalline GaN substrate by applying a straightforward and affordable technique is presented here. Such substrate was fabricated by depositing ~ 50 µm thick bulk GaN layer on porous… read more here.
Keywords: porous substrate; freestanding patterned; polycrystalline gan; patterned polycrystalline ... See more keywords