Synthesis of novel copolymer based on precipitation polymerization and its application in positive-tone photoresist
Sign Up to like & getrecommendations! Published in 2017 at "Journal of Polymer Research"
DOI: 10.1007/s10965-017-1370-9
Abstract: A series of copolymers Poly (TBA-CA-St-ASM)(PTCSA) were synthesized via precipitation polymerization by using tert-Butyl acrylate (TBA), Styrene (St), p-acetoxy styrene (ASM), and cedryl methacrylate (CA) as co-monomer. Then, Poly (TBA-CA-St-HS)(PTCSH) was prepared in the presence… read more here.
Keywords: precipitation polymerization; photoresist; synthesis; positive tone ... See more keywords
Comparison of diffraction patterns exposed by pulsed and CW lasers on positive-tone photoresist.
Sign Up to like & getrecommendations! Published in 2017 at "Applied optics"
DOI: 10.1364/ao.56.002241
Abstract: Two different grating formation geometries for recording onto the positive-tone photoresist with pulsed laser and continuous-wave sources are analyzed and compared. Diffraction efficiency measurements and atomic force microscopy (AFM) examination have been performed in order… read more here.
Keywords: diffraction; pulsed laser; tone photoresist; positive tone ... See more keywords