Optoelectronic properties of p-type NiO films deposited by direct current magnetron sputtering versus high power impulse magnetron sputtering
Sign Up to like & getrecommendations! Published in 2020 at "Applied Surface Science"
DOI: 10.1016/j.apsusc.2019.145106
Abstract: Abstract High power impulse magnetron sputtering (HiPIMS) technology has attracted lots of attention due to its high target ionization rate. This characteristic is desirable in preparing metal compounds with complex valence states. In the current… read more here.
Keywords: magnetron sputtering; high power; power impulse; films deposited ... See more keywords
Effect of an optical emission spectrometer feedback-controlled method on the characterizations of nc-TiC/a-C:H coated by high power impulse magnetron sputtering
Sign Up to like & getrecommendations! Published in 2017 at "Diamond and Related Materials"
DOI: 10.1016/j.diamond.2016.11.007
Abstract: Abstract An optical emission spectrometer (OES) feedback-controlled high power impulse magnetron sputter deposition system was used to deposit nc-TiC/a-C:H thin films in a reactive mode. The plasma emission intensity of Ti2 + ions at the emission… read more here.
Keywords: high power; feedback controlled; optical emission; power impulse ... See more keywords
Contribution of enhanced ionization to the optoelectronic properties of p-type NiO films deposited by high power impulse magnetron sputtering
Sign Up to like & getrecommendations! Published in 2019 at "Journal of The European Ceramic Society"
DOI: 10.1016/j.jeurceramsoc.2019.08.008
Abstract: Abstract Herein, intrinsic p-type conductivity of NiO films were enhanced by high power impulse magnetron sputtering (HiPIMS) technology, where more charged Ni3+ ions are created during the deposition process. The formation of Ni3+ ions are… read more here.
Keywords: nio films; high power; impulse magnetron; magnetron sputtering ... See more keywords
Effect of modulation structure on the microstructural and mechanical properties of TiAlSiN/CrN thin films prepared by high power impulse magnetron sputtering
Sign Up to like & getrecommendations! Published in 2019 at "Surface and Coatings Technology"
DOI: 10.1016/j.surfcoat.2018.11.069
Abstract: Abstract The newly developed TiAlSiN/CrN multilayer films were deposited on silicon Si (100) substrates and tungsten carbide steel substrates by high power impulse magnetron sputtering technique (HiPIMS) at 80 °C working temperature. The effect of modulation… read more here.
Keywords: high power; impulse magnetron; tialsin crn; magnetron sputtering ... See more keywords
The comparative study of electrical, optical and catalytic properties of Co3O4 thin nanocrystalline films prepared by reactive high-power impulse and radio frequency magnetron sputtering
Sign Up to like & getrecommendations! Published in 2019 at "Thin Solid Films"
DOI: 10.1016/j.tsf.2019.137427
Abstract: Abstract This paper deals with the investigation of optical and electrical properties of Co3O4. Their impact on catalytic activity in ethanol dehydrogenation is observed. The change in conductivity is provided by intentionally heating the samples… read more here.
Keywords: high power; properties co3o4; spectroscopy; radio frequency ... See more keywords
Low thermal budget annealing for thermochromic VO2 thin films prepared by high power impulse magnetron sputtering
Sign Up to like & getrecommendations! Published in 2019 at "Thin Solid Films"
DOI: 10.1016/j.tsf.2019.137443
Abstract: Abstract Thermochomic VO2 thin films are fabricated by using high power impulse magnetron sputtering at room temperature. In order to increase the crystallinity and transparency of VO2 thin films, first a buffer layer of TiO2… read more here.
Keywords: high power; thin films; impulse magnetron; vo2 thin ... See more keywords
Transparent Conductive Dielectric-Metal-Dielectric Structures for Electrochromic Applications Fabricated by High-Power Impulse Magnetron Sputtering.
Sign Up to like & getrecommendations! Published in 2019 at "ACS applied materials & interfaces"
DOI: 10.1021/acsami.9b00191
Abstract: The growing applications of electrochromic (EC) devices have generated great interest in bifunctional materials that can serve as both transparent conductive (TC) and EC coatings. WO3/Ag/WO3 (WAW) heterostructures, in principle, facilitate this extension of EC… read more here.
Keywords: magnetron sputtering; high power; impulse magnetron; power impulse ... See more keywords
Species transport on the target during high power impulse magnetron sputtering
Sign Up to like & getrecommendations! Published in 2017 at "Applied Physics Letters"
DOI: 10.1063/1.4976999
Abstract: High Power Impulse Magnetron Sputtering (HiPIMS) is a prominent technique to deposit superior materials due to the very energetic growth flux. The origin of this energetic growth flux is believed to be an electric potential… read more here.
Keywords: high power; target; power; impulse magnetron ... See more keywords
Highly conductive ultrathin Co films by high-power impulse magnetron sputtering
Sign Up to like & getrecommendations! Published in 2018 at "Applied Physics Letters"
DOI: 10.1063/1.5011109
Abstract: Ultrathin Co films deposited on SiO2 with conductivities exceeding that of Cu are demonstrated. Ionized deposition implemented by high-power impulse magnetron sputtering (HiPIMS) is shown to result in smooth films with large grains and low… read more here.
Keywords: magnetron sputtering; high power; impulse magnetron; power impulse ... See more keywords
Impact of self-sputtering in high power impulse magnetron sputtering (HiPIMS) with helium
Sign Up to like & getrecommendations! Published in 2023 at "Journal of Applied Physics"
DOI: 10.1063/5.0145547
Abstract: Conventional magnetron discharge is a widely used technology for many applications. In the last decade, the high current density sputtering regime has been an interesting alternative for tailoring thin film properties. In this paper, we… read more here.
Keywords: impulse magnetron; power impulse; magnetron; high power ... See more keywords
A unified treatment of self-sputtering, process gas recycling, and runaway for high power impulse sputtering magnetrons
Sign Up to like & getrecommendations! Published in 2017 at "Plasma Sources Science and Technology"
DOI: 10.1088/1361-6595/aa959b
Abstract: The combined processes of self-sputter (SS)-recycling and process gas recycling in high power impulse magnetron sputtering (HiPIMS) discharges are analyzed using the generalized recycling model (GR ... read more here.
Keywords: process gas; power impulse; high power; gas recycling ... See more keywords