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Published in 2017 at "Journal of Crystal Growth"
DOI: 10.1016/j.jcrysgro.2016.10.032
Abstract: Abstract Severe melt-back etching has forced the epitaxy of GaN on Si to use an AlN buffer layer for growing high-quality two-dimensional layers, despite its high resistivity. Herein, we report a metal-based pre-orienting layer (POL)…
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Keywords:
gan nanostructures;
selective area;
area growth;
pre orienting ... See more keywords