Rigorous Model-Based Mask Data Preparation Algorithm Applied to Grayscale Lithography for the Patterning at the Micrometer Scale
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DOI: 10.1109/jmems.2021.3067475
Abstract: Grayscale mask creation has for the most part been restricted to over-simplified optical and resist models usually based on a contrast curve approach. While this technique has proven to work for microstructures of large dimensions… read more here.
Keywords: preparation algorithm; mask data; mask; model ... See more keywords