WO3 thin films prepared by sedimentation and plasma sputtering
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DOI: 10.1016/j.cej.2016.09.083
Abstract: Abstract Tungsten trioxide (WO3) semiconducting thin films were prepared by (i) sedimentation process, (ii) reactive magnetron sputtering from tungsten target under various modes of plasma excitation and (iii) combination of both methods. All samples were… read more here.
Keywords: thin films; plasma; prepared sedimentation; films prepared ... See more keywords