Extreme-Pressure Imprint Lithography for Heat and Ultraviolet-Free Direct Patterning of Rigid Nanoscale Features.
Sign Up to like & getrecommendations! Published in 2021 at "ACS nano"
DOI: 10.1021/acsnano.1c02896
Abstract: Nanoimprint lithography (NIL) is typically performed by filling up of molds by heated polymers or UV-curable liquid resists, inevitably requiring subsequent pattern-transfer processes. Although direct NIL techniques have been suggested alternatively, they usually require precursors… read more here.
Keywords: imprint lithography; pressure imprint; lithography; extreme pressure ... See more keywords