Structure and mechanical properties of hafnium nitride films deposited by direct current, mid-frequency, and high-power impulse magnetron sputtering
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DOI: 10.1016/j.tsf.2018.10.035
Abstract: Abstract The structural properties of hafnium nitride films are mainly influenced by the deposition conditions, which are affected by the sputtering technique. A suitable use of the different sputtering modes allows to control the structural… read more here.
Keywords: hafnium nitride; films deposited; nitride films; magnetron ... See more keywords