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Published in 2018 at "Journal of Crystal Growth"
DOI: 10.1016/j.jcrysgro.2018.03.037
Abstract: Abstract In this paper we report about the formation of ultra heavy doped n-Ge layers on Si(0 0 1) substrates by molecular beam epitaxy and their characterization by different independent techniques. Combined study of structural and electrical…
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Keywords:
properties layers;
structural electrical;
crystalline quality;
ultra heavy ... See more keywords