Study of the properties of SiOx layers prepared by different techniques for rear side passivation in TOPCon solar cells
Sign Up to like & getrecommendations! Published in 2020 at "Materials Science in Semiconductor Processing"
DOI: 10.1016/j.mssp.2020.105163
Abstract: Abstract Passivation of n-type and p-type monocrystalline CZ Si wafers (both polished and textured) with silicon oxide layers prepared by thermal (TO), chemical (CO) and plasma (PO) techniques have been extensively investigated from the measurement… read more here.
Keywords: passivation; study; layers prepared; study properties ... See more keywords
Spectroscopic Properties of Si-nc in SiOx Films Using HFCVD
Sign Up to like & getrecommendations! Published in 2020 at "Nanomaterials"
DOI: 10.3390/nano10071415
Abstract: In the present work, non-stoichiometric silicon oxide films (SiOx) deposited using a hot filament chemical vapor deposition technique at short time and simple parameters of depositions are reported. This is motivated by the numerous potential… read more here.
Keywords: spectroscopic properties; siox films; using hfcvd; films using ... See more keywords