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Published in 2020 at "Journal of Applied Physics"
DOI: 10.1063/5.0028760
Abstract: The generation of p-type GaN through ion implantation is an attractive proposition in the massive production of GaN-based bipolar devices, whereas the removal of implantation induced lattice disturbances and defects is a difficult exercise and…
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Keywords:
property manipulation;
high dose;
laser annealing;
implanted gan ... See more keywords