Method for improving the speed and pattern quality of a DMD maskless lithography system using a pulse exposure method.
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DOI: 10.1364/oe.460780
Abstract: Maskless lithography based on a digital micromirror device (DMD) has the advantages of high process flexibility and a low production cost. However, due to the trade-off relationship between the pixel size and exposure area, it… read more here.
Keywords: pattern quality; dmd; pulse exposure; method ... See more keywords