Environmental Effects on Post-CMP PVAc Brush Releasable Contamination and Break-In Optimization for Advanced Logic and Memory Technologies
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DOI: 10.1149/2.0161912jss
Abstract: Advanced sub-7nm logic and VNAND memory technologies are becoming more reliant on Chemical Mechanical Planarization (CMP). New layers and materials are being introduced with each new technology node and integration scheme. Polyvinyl-acetal (PVAc) brushes are… read more here.
Keywords: releasable contamination; pvac brush; post cmp; break ... See more keywords