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Published in 2020 at "Journal of Crystal Growth"
DOI: 10.1016/j.jcrysgro.2020.125605
Abstract: Abstract We investigate the relation between growth mode and crystalline quality of AlN directly grown on an on-axis 6H-SiC(0001) substrate under various supersaturation conditions by metal-organic chemical vapor deposition. Although 500-nm-thick AlN fabricated by a…
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Keywords:
growth mode;
crystalline quality;
quality aln;
tdd ... See more keywords
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1
Published in 2017 at "Scientific Reports"
DOI: 10.1038/s41598-017-07616-8
Abstract: Abstract1.5-μm AlN grown by metal-organic chemical vapor deposition (MOCVD), with a single substrate temperature of 1180 °C, exhibits atomically flat surface and the XRD (102) peak width of 427 arcsec. The results are achieved with a pulsed…
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Keywords:
temperature;
aln grown;
substrate temperature;
single substrate ... See more keywords
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Published in 2017 at "Scientific Reports"
DOI: 10.1038/srep42747
Abstract: Influence of sapphire pretreatment conditions on crystalline quality of AlN epilayers has been investigated by metal organic chemical vapor deposition (MOCVD). Compared to alumination treatment, it is found that appropriate sapphire nitridation significantly straightens the…
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Keywords:
aln epilayers;
quality aln;
metal organic;
sapphire ... See more keywords
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Published in 2018 at "CrystEngComm"
DOI: 10.1039/c8ce01473f
Abstract: We propose a new growth technique, ammonia-free high temperature metalorganic vapor phase epitaxy (AFHT-MOVPE), for high quality AlN growth. Nitrogen (N2) gas, instead of ammonia (NH3) gas in the conventional MOVPE growth technique, is used…
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Keywords:
technique;
high quality;
quality aln;
aln growth ... See more keywords
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Published in 2017 at "Applied Physics Letters"
DOI: 10.1063/1.5008258
Abstract: We developed a method for fabricating high-crystal-quality AlN films by combining a randomly distributed nanosized concavo–convex sapphire substrate (NCC-SS) and a three-step growth method optimized for NCC-SS, i.e., a 3-nm-thick nucleation layer (870 °C), a 150-nm-thick…
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Keywords:
quality;
sapphire substrate;
surface;
quality aln ... See more keywords
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2
Published in 2022 at "Micromachines"
DOI: 10.3390/mi13010129
Abstract: High-quality AlN film is a key factor affecting the performance of deep-ultraviolet optoelectronic devices. In this work, high-temperature annealing technology in a nitrogen atmosphere was used to improve the quality of AlN films with different…
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Keywords:
aln films;
different polarities;
crystal quality;
quality ... See more keywords
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1
Published in 2022 at "Nanomaterials"
DOI: 10.3390/nano12234169
Abstract: The ultra-wide bandgap (~6.2 eV), thermal stability and radiation tolerance of AlN make it an ideal choice for preparation of high-performance far-ultraviolet photodetectors (FUV PDs). However, the challenge of epitaxial crack-free AlN single-crystalline films (SCFs)…
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Keywords:
aln films;
heteroepitaxy growth;
quality aln;
far ultraviolet ... See more keywords